Publications

by Keyword: Electrodeposition


By year:[ 2019 | 2018 | 2017 | 2016 | 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | 2009 | 2008 | 2007 | 2006 | 2005 ]

Vidal, E., Buxadera-Palomero, J., Pierre, C., Manero, J. M., Ginebra, M. P., Cazalbou, S., Combes, C., Rupérez, E., Rodríguez, D., (2019). Single-step pulsed electrodeposition of calcium phosphate coatings on titanium for drug delivery Surface and Coatings Technology 358, 266-275

Metallic implants have some limitations related to bioactivity and bacteria colonization leading to infections. In this regard, calcium phosphate coatings can be used as carrier for drug delivery in order to improve the mentioned drawbacks. The present work proposes the introduction of an antibacterial agent in the course of a pulsed and reverse pulsed electrodeposition. Calcium phosphate coatings were prepared in 30 min using different pulse waveforms (unipolar-bipolar), current densities (2–5 mA/cm2) and temperatures (40–60 °C). Mechanical stability of the as-coated surfaces was studied in order to select the optimal electrodeposition conditions. Subsequently, selected coatings were loaded with an antiseptic agent, chlorhexidine digluconate (CHX), via a single-step co-deposition procedure. CHX concentration added to the electrolyte was adjusted to 3 mM based on the antibacterial efficacy of the loaded coatings evaluated in vitro with Staphylococcus aureus and Escherichia coli bacteria strains. Whereas the same chlorhexidine concentration was added to the electrolyte, results showed that the amount of CHX loaded was different for each condition while release kinetics was maintained. The results of this work demonstrate that a pulsed co-deposition strategy has great potential to modulate local delivery of antibacterial agents such as chlorhexidine digluconate, which may prevent early phase infections of metallic implants after insertion.

Keywords: Antibacterial agent, Calcium phosphate, Characterization, Coating, Pulse electrodeposition, Titanium


Sebastian, P., Giannotti, M. I., Gómez, E., Feliu, J. M., (2018). Surface sensitive nickel electrodeposition in deep eutectic solvent ACS Applied Energy Materials , 1, (3), 1016-1028

The first steps of nickel electrodeposition in a deep eutectic solvent (DES) are analyzed in detail. Several substrates from glassy carbon to Pt(111) were investigated pointing out the surface sensitivity of the nucleation and growth mechanism. For that, cyclic voltammetry and chronoamperometry, in combination with scanning electron microscopy (SEM), were employed. X-ray diffraction (XRD) and atomic force microscopy (AFM) were used to more deeply analyze the Ni deposition on Pt substrates. In a 0.1 M NiCl2 + DES solution (at 70 °C), the nickel deposition on glassy carbon takes place within the potential limits of the electrode in the blank solution. Although, the electrochemical window of Pt|DES is considerably shorter than on glassy carbon|DES, it was still sufficient for the nickel deposition. On the Pt electrode, the negative potential limit was enlarged while the nickel deposit grew, likely because of the lower catalytic activity of the nickel toward the reduction of the DES. At lower overpotentials, different hydrogenated Ni structures were favored, most likely because of the DES co-reduction on the Pt substrate. Nanometric metallic nickel grains of rounded shape were obtained on any substrate, as evidenced by the FE-SEM. Passivation phenomena, related to the formation of Ni oxide and Ni hydroxylated species, were observed at high applied overpotentials. At low deposited charge, on Pt(111) the AFM measurements showed the formation of rounded nanometric particles of Ni, which rearranged and formed small triangular arrays at sufficiently low applied overpotential. This particle pattern was induced by the (111) orientation and related to surface sensitivity of the nickel deposition in DES. The present work provides deep insights into the Ni electrodeposition mechanism in the selected deep eutectic solvent.

Keywords: AFM, Deep eutectic solvent, Glassy carbon, Nanostructures, Nickel electrodeposition, Platinum electrode, Pt(111), SEM, Surface sensitive


Arvizu-Rodríguez, L. E., Palacios-Padrós, A., Chalé-Lara, F., Fernández-Muñoz, J. L., Díez-Pérez, I., Sanz, F., Espinosa-Faller, F. J., Sandoval, J., Caballero-Briones, F., (2015). Phase and surface modification by electrochemical post deposition treatments in ultrasonic-assisted CuInSe2/Cu electrodeposited films Chalcogenide Letters , 12, (10), 537-545

CuInSe2 films were prepared onto Cu-cladded substrates by ultrasonic-assisted electrodeposition using different bath compositions and a fixed deposition potential of E=-1500 mV vs Ag/AgCl. In situ electrochemical treatments named selenization and electrocrystallization, in a Se4+ electrolyte were applied to modify the morphology, film structure and the phase composition. Films were characterized by scanning electron microscopy, X-ray diffraction, Raman spectroscopy and photocurrent response. A Cu2-xSe layer develops as the electrode is introduced into the electrolyte. The presence of Cu-In, In-Se, Cu-Se, cubic, hexagonal and tetragonal CuInSe2 phases as well as elemental In and Se was observed. After selenization, partial phase dissolution and Se deposition is observed and after the electrocrystallization treatment the secondary phases such as Cu-Se, Cu-In, In and Se reduce substantially and the grain sizes increase, as well as the photocurrent response. Phase diagrams are constructed for each set of films and reaction mechanisms are proposed to explain the phase evolution.

Keywords: CuInSe2, Electrodeposition, In situ electrochemical treatments, Phase composition, Surface modification


Caballero-Briones, F., Palacios-Padrós, A., Sanz, Fausto, (2011). CuInSe2 films prepared by three step pulsed electrodeposition. Deposition mechanisms, optical and photoelectrochemical studies Electrochimica Acta , 56, (26), 9556-9567

p-Type semiconducting copper indium diselenide thin films have been prepared onto In2O3:Sn substrates by a recently developed pulse electrodeposition method that consists in repeated cycles of three potential application steps. The Cu–In–Se electrochemical system and the related single component electrolytes were studied by cyclic voltammetry to identify the electrode processes and study the deposition processes. In situ atomic force microscopy measurements during the first 100 deposition cycles denote a continuous nucleation and growth mechanism. Particles removed by film sonication from some of the films were characterized by transmission electron microscopy and determined to consist in nanoscopic and crystalline CuInSe2. The remaining film is still crystalline CuInSe2, as assessed by X-ray diffraction. The chemical characterization by combined X-ray photoelectron spectroscopy, X-ray fluorescence and inductively coupled plasma optical emission spectroscopy, showed that films were Cu-poor and Se-poor. Raman characterization of the as-grown films showed that film composition varies with film thickness; thinner films are Se-rich, while thicker ones have an increased Cu–Se content. Different optical absorption bands were identified by the analysis of the UV–NIR transmittance spectra that were related with the presence of CuInSe2, ordered vacancy compounds, Se, Cu2−xSe and In2Se3. The photoelectrochemical activity confirmed the p-type character and showed a better response for the films prepared with the pulse method.

Keywords: CuInSe2, Solar cells, Electrodeposition, Optical properties, As-deposited films, ITO substrate


Palacios-Padros, A., Caballero-Briones, F., Sanz, F., (2010). Enhancement in as-grown CuInSe2 film microstructure by a three potential pulsed electrodeposition method Electrochemistry Communications , 12, (8), 1025-1029

P-type copper indium diselenide (CuInSe2) films have been prepared onto ITO substrates by an electrodeposition method, that sequentially applies potential pulses at the deposition potential of each element Cu, Se and In, and then step it back in cyclically to induce the solid state reaction between the elements. Two electrolyte concentrations as well as three different pulse durations were assessed. The resulting films were compared with those deposited at fixed electrode potentials. As-grown films are nanocrystalline and have an E-g similar to 0.95 eV. Raman spectroscopy shows that Se and Cu-Se contents decrease while pulse duration increases and electrolyte concentration decreases. Cu-Se phases are even absent for films grown at the low electrolyte concentration. These results represent a great improvement in the film phase purity reducing the need of post-deposition treatments.

Keywords: CIS, Pulsed electrodeposition, Raman, Solar cells